DocumentCode :
387012
Title :
A GaAs Monolithic Phase Shifter for 30 GHz Application
Author :
Sokolov, V. ; Bauhahn, P. ; Geddes, J. ; Contolatis, T. ; Chao, C.
Volume :
83
Issue :
1
fYear :
1983
fDate :
31 May-1 Jun 1983
Firstpage :
40
Lastpage :
44
Abstract :
The design and performance of a GaAs monolithic 180 degrees one-bit phase shifter test circuit for Ka-band operation is presented. Over the 27.5 to 30 GHz band the measured differential phase shift is within 10 degrees of the ideal characteristic and the insertion loss is between 4 and 6 dB. The switching FETs are fabricated by ion implantation into LEC material using a power FET implant schedule. I-V characteristics are also presented for a self-aligned gate FET whose channel resistance is reduced by more than a factor of two relative to the power FET. This latter fabrication technique holds promise in reducing phase shifter insertion loss for mm-wave applications.
Keywords :
Circuit testing; FETs; Fabrication; Gallium arsenide; Implants; Insertion loss; Ion implantation; Loss measurement; Phase measurement; Phase shifters;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microwave and Millimeter-Wave Monolithic Circuits
Type :
conf
DOI :
10.1109/MCS.1983.1151039
Filename :
1151039
Link To Document :
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