DocumentCode
38880
Title
RF Performance Limits and Operating Physics Arising From the Lack of a Bandgap in Graphene Transistors
Author
Holland, Kyle D. ; Paydavosi, Navid ; Neophytou, N. ; Kienle, Diego ; Vaidyanathan, Mani
Author_Institution
Dept. of Electr. & Comput. Eng., Univ. of Alberta, Edmonton, AB, Canada
Volume
12
Issue
4
fYear
2013
fDate
Jul-13
Firstpage
566
Lastpage
577
Abstract
With the aid of self-consistent quantum-mechanical simulations and simple expressions for the radio-frequency (RF) metrics, we examine the impact of a lack of a bandgap on limiting the RF potential of graphene transistors. We consider the transconductance, gate-input capacitance, output conductance, unity-current-gain frequency, and unity-power-gain frequency. We show that the lack of a bandgap leads to all RF metrics being optimal when the bias point is chosen such that the drain Fermi level aligns with the Dirac point at the midpoint of the channel. We are also able to quantify the precise extent to which the lack of a bandgap limits the transistor´s cutoff frequencies, an issue that has been flagged as requiring crucial attention to make graphene transistors competitive. For an 18-nm channel length, we show that the extrinsic unity-current-gain frequency could be improved by 300 GHz and the unity-power-gain frequency could be doubled if a bandgap could be introduced to reduce the output conductance to zero.
Keywords
Fermi level; capacitance; electrical conductivity; energy gap; field effect transistors; fullerene devices; graphene; C; RF performance limits; RF potential; band gap; bias point; drain Fermi level; frequency 300 GHz; gate-input capacitance; graphene transistors; output conductance; radio-frequency metrics; selfconsistent quantum-mechanical simulations; size 18 nm; transconductance; transistor cutoff frequency; unity-current-gain frequency; unity-power-gain frequency; Bandgap; cutoff frequency; field-effect transistor (FET); graphene; high-frequency behavior; output conductance; parasitic capacitance; parasitic resistance; radio-frequency (RF) behavior;
fLanguage
English
Journal_Title
Nanotechnology, IEEE Transactions on
Publisher
ieee
ISSN
1536-125X
Type
jour
DOI
10.1109/TNANO.2013.2260351
Filename
6509454
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