DocumentCode :
39003
Title :
Plasmonic Rainbow Trapping by a Silica–Graphene–Silica on a Sloping Silicon Substrate
Author :
Xiang Yin ; Tian Zhang ; Lin Chen ; Xun Li
Author_Institution :
Wuhan Nat. Lab. for Optoelectron., Huazhong Univ. of Sci. & Technol., Wuhan, China
Volume :
32
Issue :
21
fYear :
2014
fDate :
Nov.1, 1 2014
Firstpage :
4193
Lastpage :
4198
Abstract :
We give a proposal for plasmonic rainbow trapping based on a novel structure comprised of a silica-graphene-silica on a sloping silicon substrate, which, importantly, overcomes the intrinsic constraints that are required by metal/dielectric interface. As compared with previous plasmonic grating structures for rainbow trapping, the adiabatic control of the dispersion curve for the present one is achieved by gradually changing the equivalent permittivity of the graphene monolayer via the gap separation between the graphene monolayer and the silicon substrate. We attribute the rainbow trapping effect to the correlative dispersive relation between the slow plasmonic mode and the gap separation between the graphene monolayer and silicon substrate, which leads to the localization of light waves of different frequencies at different positions on the graphene surface. The group velocity can be reduced to be 1000 times smaller than light velocity in air, which is 1-2 smaller than that was previously reported in dielectric gratings-based plasmonic structures.
Keywords :
dielectric materials; diffraction gratings; graphene; monolayers; optical materials; optical multilayers; permittivity; plasmonics; silicon; silicon compounds; Si; SiO2-C-SiO2; adiabatic control; correlative dispersive relation; dielectric gratings-based plasmonic structures; dispersion curve; equivalent permittivity; gap separation; graphene monolayer; graphene surface; group velocity; light velocity; light wave localization; metal/dielectric interface; plasmonic grating structures; plasmonic rainbow trapping; rainbow trapping effect; sloping silicon substrate; slow plasmonic mode; Charge carrier processes; Dispersion; Graphene; Metals; Plasmons; Silicon; Substrates; Nanophotonics; optical waveguides; plasmons;
fLanguage :
English
Journal_Title :
Lightwave Technology, Journal of
Publisher :
ieee
ISSN :
0733-8724
Type :
jour
DOI :
10.1109/JLT.2014.2350481
Filename :
6881638
Link To Document :
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