• DocumentCode
    39116
  • Title

    Size Effect of Inserted Iron Nanoparticles in the MgO-Based Double Barrier Magnetic Tunnel Junction

  • Author

    Yen-Chi Lee ; Chia-Hao Lin ; Mishra, Akhilesh Kumar ; Te-Ho Wu ; Jong-Ching Wu

  • Author_Institution
    Dept. of Phys., Nat. Changhua Univ. of Educ., Changhua, Taiwan
  • Volume
    50
  • Issue
    1
  • fYear
    2014
  • fDate
    Jan. 2014
  • Firstpage
    1
  • Lastpage
    3
  • Abstract
    The transport properties of stacked CoFeB (1.86)/MgO (0.2)/Fe-nanoparticles ( tFe)/MgO (0.5)/CoFeB(0.6) double barrier magnetic tunnel junctions have been characterized. In this investigation, stacked film is prepared by magnetron sputter system, annealed at 250 °, and patterned into a micron-scale device using standard electron beam lithography in conjunction with two-angle ion beam etching. First, the structure, magnetic and electrical properties are examined by using transmission electron microscopy, alternating gradient magnetometers, and lock-in techniques. Stacked film having 1.5 nm lateral size of iron nanoparticles (sample S1) exhibits an in-plane magnetic anisotropy, nonetheless the stacked film having 2 nm lateral size of iron nanoparticles (sample S5) possesses out-of-plane magnetic anisotropy. In addition, the micron scaled S1 device displays not only a normal in-plane magnetoresistance (MR) curve but also an anomalous out-of-plane MR behavior, whereas the S5 device only barely shows magnetic response in the in-plane MR. A hysteresis-free linear region in out-of-plane MR curve has shown field sensitivity of ~ 36 Ω/Oe that is promising for magnetic field sensor applications.
  • Keywords
    boron alloys; cobalt alloys; electron beam lithography; iron; iron alloys; magnesium compounds; magnetic anisotropy; magnetic tunnelling; magnetoresistance; size effect; sputter etching; transmission electron microscopy; CoFeB-MgO-Fe-MgO-CoFeB; alternating gradient magnetometers; annealing; double barrier magnetic tunnel junction; electrical properties; electron beam lithography; hysteresis-free linear region; in-plane magnetoresistance; iron nanoparticles; lock-in techniques; magnetic properties; magnetron sputter system; out-of-plane magnetic anisotropy; size 1.5 nm; size 2 nm; size effect; structural properties; temperature 250 degC; transmission electron microscopy; transport properties; two-angle ion beam etching; Iron; Junctions; Magnetic resonance; Magnetic tunneling; Magnetometers; Magnetoresistance; Nanoparticles; Double barrier magnetic tunnel junction (DBMTJ); iron nanoparticles; size effect;
  • fLanguage
    English
  • Journal_Title
    Magnetics, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9464
  • Type

    jour

  • DOI
    10.1109/TMAG.2013.2276014
  • Filename
    6693009