• DocumentCode
    391555
  • Title

    Non-metallurgical bonding technology with super-narrow gap for 3D stacked LSI

  • Author

    Umemoto, Mitsuo ; Tanida, Kazumasa ; Tomita, Yoshihiro ; Takahashi, Tatsuro ; Takahashi, Kenji

  • Author_Institution
    Assoc. of Super-Adv. Electron. Technol. (ASET), Tsukuba Res. Center, Ibaraki, Japan
  • fYear
    2002
  • fDate
    10-12 Dec. 2002
  • Firstpage
    285
  • Lastpage
    288
  • Abstract
    The chip-stacking technologies with the thin devices in hyperfine pitch realize both of the strong demands for the high-speed signal transmission and the high-density packaging. The results of the experiments on the non-metallurgical bonding and encapsulation with nonconductive particle paste (NCP) are introduced. It realizes void-free encapsulation of under 10-μm-thick gap, small warpage of 50-μm-thick chip, and ohmic contact of all of 1844 bumps in 20-μm-pitch. Additionally, it is found the flatness of chip backside is achieved sufficient level for the thin chip stacking process with hyper fine pitch interconnection.
  • Keywords
    encapsulation; fine-pitch technology; integrated circuit bonding; integrated circuit interconnections; integrated circuit packaging; large scale integration; ohmic contacts; 20 micron; 3D stacked LSI; encapsulation; high-density packaging; high-speed signal transmission; hyperfine pitch interconnection; nonconductive particle paste; nonmetallurgical bonding technology; ohmic contact; super-narrow gap; thin device; Bonding; Copper; Electrodes; Electronics packaging; Encapsulation; Gold; Large scale integration; Ohmic contacts; Stacking; Wiring;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronics Packaging Technology Conference, 2002. 4th
  • Print_ISBN
    0-7803-7435-5
  • Type

    conf

  • DOI
    10.1109/EPTC.2002.1185684
  • Filename
    1185684