Title :
Design of Step-Index Optical Waveguides by Ion Implantation
Author :
Ramirez-Espinoza, C. ; Salazar, D. ; Rangel-Rojo, R. ; Angel-Valenzuela, J.L. ; Vazquez, G.V. ; Flores-Romero, E. ; Rodriguez-Fernandez, L. ; Oliver, A. ; Dominguez, D.A. ; Marquez, H.
Author_Institution :
Centro de Investig. Cienc. y de Educ. Super. de Ensenada, Ensenada, Mexico
Abstract :
Step-index optical waveguides have been obtained by means of silver ion implantation on fused silica substrates. Step index profiles have been reached using a sequential multiple ion implantation process with energies of implantation from 4.3 to 9 MeV and fluences of 1014-1015 ions/cm2. Optical absorption spectra, propagation losses, intensity distribution, and effective refractive indices of the propagation modes of the waveguides are presented. An approach of refractive index profile of ion-implanted waveguides was fitted as function of polarizability, compaction, and stress.
Keywords :
ion implantation; optical design techniques; optical fabrication; optical waveguides; refractive index; silicon compounds; SiO2; compaction; electron volt energy 4.3 MeV to 9 MeV; fused silica substrates; intensity distribution; ion-implanted waveguides; optical absorption spectra; polarizability; propagation losses; propagation mode; refractive index profile; sequential multiple ion implantation process; silver ion implantation; step index profiles; step-index optical waveguide design; stress; Ion implantation; Optical polarization; Optical refraction; Optical variables control; Optical waveguides; Particle beam optics; Refractive index; Fused silica; Ion implantation; fused silica; ion implantation; optical waveguide;
Journal_Title :
Lightwave Technology, Journal of
DOI :
10.1109/JLT.2015.2422684
