DocumentCode :
391999
Title :
Thin film resistor and conductor on Duroid® soft material
Author :
Yueli, Qin ; Nengwu, Gao ; Fei, Xie
Author_Institution :
Southwest Res. Inst. of Electron. Equip., China
fYear :
2002
fDate :
17-19 Aug. 2002
Firstpage :
158
Lastpage :
162
Abstract :
The appearance of the RT/Duroid® without copper is not suitable for manufacturing thin film resistor and conductor due to the tissue of the material. Changing the appearance is necessary for thin film purposes. The thin film resistor and conductor are realized on the changed Duroid material by sputtering, photolithography and etching technologies. The properties of the integrated resistors are discussed in detail in this paper. The method is useful to miniaturize and integrate the microwave products.
Keywords :
etching; microwave integrated circuits; photolithography; sputter deposition; thin film resistors; Duroid soft material; etching; microwave integrated circuits; microwave products; photolithography; sputtering; thin film conductor; thin film resistor; Biological materials; Conducting materials; Conductive films; Copper; Lithography; Manufacturing; Resistors; Sputter etching; Sputtering; Transistors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microwave and Millimeter Wave Technology, 2002. Proceedings. ICMMT 2002. 2002 3rd International Conference on
Print_ISBN :
0-7803-7486-X
Type :
conf
DOI :
10.1109/ICMMT.2002.1187659
Filename :
1187659
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=391999
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