DocumentCode
39283
Title
Compact Analytical Drain Current Model of Gate-All-Around Nanowire Tunneling FET
Author
Vishnoi, Rajat ; Kumar, M.J.
Author_Institution
Dept. of Electr. Eng., IIT Delhi, New Delhi, India
Volume
61
Issue
7
fYear
2014
fDate
Jul-14
Firstpage
2599
Lastpage
2603
Abstract
In this paper, we propose a 2-D analytical model for surface potential and drain current for a long channel p-type gate-all-around nanowire tunneling field effect transistor with a circular cross section. This model includes the effect of drain voltage, gate metal work function, oxide thickness, and radius of the silicon nanowire without assuming a fully depleted channel. The proposed model also includes the effect of the variation in the tunneling volume with the applied gate voltage. The model is tested using 3-D numerical simulations and is found to be accurate for all gate voltages except for subthreshold region.
Keywords
elemental semiconductors; field effect transistors; nanowires; silicon; surface potential; tunnel transistors; circular cross section; compact analytical drain current model; drain voltage; gate metal; gate-all-around nanowire tunneling FET; oxide thickness; silicon nanowire; surface potential; Analytical models; Logic gates; Numerical models; Silicon; Solid modeling; Transistors; Tunneling; Compact model; OFF-state current; ON-state current; gate-all-around (GAA); nanowires; subthreshold slope (SS); tunneling field effect transistor (TFET);
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/TED.2014.2322762
Filename
6826562
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