DocumentCode :
39283
Title :
Compact Analytical Drain Current Model of Gate-All-Around Nanowire Tunneling FET
Author :
Vishnoi, Rajat ; Kumar, M.J.
Author_Institution :
Dept. of Electr. Eng., IIT Delhi, New Delhi, India
Volume :
61
Issue :
7
fYear :
2014
fDate :
Jul-14
Firstpage :
2599
Lastpage :
2603
Abstract :
In this paper, we propose a 2-D analytical model for surface potential and drain current for a long channel p-type gate-all-around nanowire tunneling field effect transistor with a circular cross section. This model includes the effect of drain voltage, gate metal work function, oxide thickness, and radius of the silicon nanowire without assuming a fully depleted channel. The proposed model also includes the effect of the variation in the tunneling volume with the applied gate voltage. The model is tested using 3-D numerical simulations and is found to be accurate for all gate voltages except for subthreshold region.
Keywords :
elemental semiconductors; field effect transistors; nanowires; silicon; surface potential; tunnel transistors; circular cross section; compact analytical drain current model; drain voltage; gate metal; gate-all-around nanowire tunneling FET; oxide thickness; silicon nanowire; surface potential; Analytical models; Logic gates; Numerical models; Silicon; Solid modeling; Transistors; Tunneling; Compact model; OFF-state current; ON-state current; gate-all-around (GAA); nanowires; subthreshold slope (SS); tunneling field effect transistor (TFET);
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2014.2322762
Filename :
6826562
Link To Document :
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