• DocumentCode
    39283
  • Title

    Compact Analytical Drain Current Model of Gate-All-Around Nanowire Tunneling FET

  • Author

    Vishnoi, Rajat ; Kumar, M.J.

  • Author_Institution
    Dept. of Electr. Eng., IIT Delhi, New Delhi, India
  • Volume
    61
  • Issue
    7
  • fYear
    2014
  • fDate
    Jul-14
  • Firstpage
    2599
  • Lastpage
    2603
  • Abstract
    In this paper, we propose a 2-D analytical model for surface potential and drain current for a long channel p-type gate-all-around nanowire tunneling field effect transistor with a circular cross section. This model includes the effect of drain voltage, gate metal work function, oxide thickness, and radius of the silicon nanowire without assuming a fully depleted channel. The proposed model also includes the effect of the variation in the tunneling volume with the applied gate voltage. The model is tested using 3-D numerical simulations and is found to be accurate for all gate voltages except for subthreshold region.
  • Keywords
    elemental semiconductors; field effect transistors; nanowires; silicon; surface potential; tunnel transistors; circular cross section; compact analytical drain current model; drain voltage; gate metal; gate-all-around nanowire tunneling FET; oxide thickness; silicon nanowire; surface potential; Analytical models; Logic gates; Numerical models; Silicon; Solid modeling; Transistors; Tunneling; Compact model; OFF-state current; ON-state current; gate-all-around (GAA); nanowires; subthreshold slope (SS); tunneling field effect transistor (TFET);
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2014.2322762
  • Filename
    6826562