Multiring Circular Transmission Line Model for Ultralow Contact Resistivity Extraction

Author

Hao Yu ; Schaekers, Marc ; Schram, Tom ; Rosseel, Erik ; Martens, Koen ; Demuynck, Steven ; Horiguchi, Naoto ; Barla, Kathy ; Collaert, Nadine ; De Meyer, Kristin ; Thean, Aaron

Author_Institution

Dept. of Electr. Eng., Katholieke Univ. Leuven, Leuven, Belgium

Volume

36

Issue

6

fYear

2015

fDate

Jun-15

Firstpage

600

Lastpage

602

Abstract

Accurate determination of contact resistivities (P_c) below 1 × 10^-8 Ω · cm² is challenging. Among the frequently applied transmission line models (TLMs), circular TLM (CTLM) has a simple process flow, while refined TLM (RTLM) has a high Pc accuracy at the expense of a more complex fabrication. In this letter, we will present a novel model-multiring CTLM (MR-CTLM), which combines the advantages of a simple process and a high Pc extraction resolution. We fabricated ultralow-Pc Ti/n-Si contacts and demonstrated the capability of MR-CTLM to extract the P_c as low as 6.2 × 10^-9 Ω · cm² with high precision.

Keywords

contact resistance; transmission line theory; MR-CTLM; RTLM; Ti-Si; contact resistivity; multiring circular transmission line model; refined TLM; ultralow contact resistivity extraction; ultralow contacts; Accuracy; Electrodes; Metals; Power transmission lines; Probes; Resistance; Silicon; Contact resistance; circular transmission line model; simulation; transmission line model;

fLanguage

English

Journal_Title

Electron Device Letters, IEEE

Publisher

ieee

ISSN

0741-3106

Type

jour

DOI

10.1109/LED.2015.2425792

Filename

7093127