DocumentCode :
393381
Title :
Accurate prediction of the impact of on-chip inductance on interconnect delay using electrical and physical parameter-based RSF
Author :
Sato, Takashi ; Kanamoto, Toshiki ; Kurokawa, Atsushi ; Kawakami, Yoshiyuki ; Oka, Hikaru ; Kitaura, Tomoyasu ; Kobayashi, Hiroyuki ; Hashimoto, Masanori
fYear :
2003
fDate :
21-24 Jan. 2003
Firstpage :
149
Lastpage :
155
Abstract :
This paper proposes a new methodology to accurately predict the impact of inductance on on-chip wire delay using response surface functions (RSF). The proposed methodology consists of two stages which involves first calculating the delay difference between RC and RLC wire models for a set of parameter variations, then building RSFs using electrical parameters such as wire resistance, capacitance, etc., and physical parameters such as wire width, pitch, etc. as variables. The proposed methodology can help 1) to define design rules for avoiding inductance effects, 2) to point out wires that require RLC delay calculation, and 3) to estimate and correct the delay when using an RC model. An example design rule for limiting self inductance and accurate estimation of the delay difference for a 100 nm technology node is also presented.
Keywords :
VLSI; delay estimation; inductance; integrated circuit interconnections; integrated circuit modelling; response surface methodology; 100 nm; RC wire model; RLC delay calculation; RLC wire model; interconnect delay; on-chip inductance; on-chip wire delay; parameter variations; response surface functions; wire capacitance; wire resistance; Delay effects; Delay estimation; Electronic design automation and methodology; Inductance; Integrated circuit interconnections; Process design; RLC circuits; Response surface methodology; System-on-a-chip; Wire;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Design Automation Conference, 2003. Proceedings of the ASP-DAC 2003. Asia and South Pacific
Print_ISBN :
0-7803-7659-5
Type :
conf
DOI :
10.1109/ASPDAC.2003.1195008
Filename :
1195008
Link To Document :
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