Development of highly sensitive Ni foil temperature sensor

Author

Ichida, Shunji ; Yamaguchi, Toru ; Okamoto, Tohru ; Zama, Matsuo

Author_Institution

Yamatake Corp, Fujisawa, Japan

Volume

4

fYear

2002

fDate

5-7 Aug. 2002

Firstpage

2448

Abstract

We have developed a:highly-sensitive Ni foil temperature sensor with excellent long-term stability. It enables the fine control of the temperature with no run-to-run calibration and thus can be applied to the energy saving field or semiconductor fabrication. We have improved its fabrication procedure and obtained a more sensitive and more stable sensor. Thermal time constant of it is less than 1 s in water, less than 10 s in air within ±2mK/month of stability. Its dissipation constant in a φ×30 mm protective pipe is about 1 mW/K in air and about 1.8 mW/K in fluorinated liquid. Its resistance value is 1 kΩ at 0°C temperature coefficient of resistance (TCR) ranges from about 6000 ppm/K to about 8000 ppm/K between 0°C and 150°C.

Keywords

foils; nickel; sensitivity; stability; temperature sensors; 0 to 150 degC; 1 kohm; 1 s; 10 s; Ni; Ni foil temperature sensor; energy saving field; fabrication procedure; highly sensitive temperature sensor; long-term stability; semiconductor fabrication; thermal time constants; Etching; Fabrication; Glass; Joining processes; Protection; Resins; Resistors; Stability; Temperature sensors; Wires;

fLanguage

English

Publisher

ieee

Conference_Titel

SICE 2002. Proceedings of the 41st SICE Annual Conference

Print_ISBN

0-7803-7631-5

Type

conf

DOI

10.1109/SICE.2002.1195796

Filename

1195796