Imaging polarimetry with an micro-retarder array

Author

Kikuta, H. ; Numata, K. ; Arimitsu, H. ; Iwata, K. ; Kato, N.

Author_Institution

Osaka Prefectural Univ., Sakai, Japan

Volume

4

fYear

2002

fDate

5-7 Aug. 2002

Firstpage

2510

Abstract

We developed a 92×70 micro retarder array for an imaging polarimetry. The micro retarder array consists of polyimide subwavelength-period gratings of 300 nm period with different orientations. The phase retardance is caused by the form birefringence of the subwavelength structure. The gratings were fabricated with the direct-writing electron-beam lithography and the reactive ion etching. The phase retardance was 0.57 π for the 550 nm light wavelength. We have observed a birefringence image of a tensed plastic film by using the imaging polarimetry system.

Keywords

diffraction gratings; electron beam lithography; micro-optics; optical fabrication; optical images; optical polymers; optical retarders; polarimetry; sputter etching; 300 nm; 550 nm; birefringence image; direct-writing electron-beam lithography; form birefringence; imaging polarimetry; micro-retarder array; phase retardance; polyimide subwavelength-period gratings; reactive ion etching; subwavelength structure; tensed plastic film; Birefringence; Charge coupled devices; Charge-coupled image sensors; Gratings; Image sensors; Lenses; Optical polarization; Polarimetry; Sensor arrays; Stokes parameters;

fLanguage

English

Publisher

ieee

Conference_Titel

SICE 2002. Proceedings of the 41st SICE Annual Conference

Print_ISBN

0-7803-7631-5

Type

conf

DOI

10.1109/SICE.2002.1195810

Filename

1195810