DocumentCode :
39415
Title :
Heat Treatment Methods on Magnetic Properties and Microstructure of FePd Alloy Thin Films
Author :
An-Cheng Sun ; Ko-An Hsu ; Chuan-Fa Huang
Author_Institution :
Dept. of Chem. Eng. & Mater. Sci., Yuan-Ze Univ., Chung-Li, Taiwan
Volume :
50
Issue :
1
fYear :
2014
fDate :
Jan. 2014
Firstpage :
1
Lastpage :
4
Abstract :
Fe52Pd48 thin films with thickness of 10 nm were deposited on the glass substrate at room temperature and subsequently annealed at 600-900°C through three different heat treatment procedures: (A) furnace heating as well as quenching in the ice water; (B) furnace heating and then natural cooling in a furnace; and (C) rapid thermal annealing (RTA). The results show that the FePd films annealed at 800°C with procedures (A) and (B) present magnetic isotropy behaviors, whereas magnetic anisotropy is gradually switched to perpendicular with procedure (C). Further RTA of the FePd films with different temperatures, the film morphology is a continuous structure with well connected magnetic grains in as-deposited state, and it starts to agglomerate at 600°C and then turns into particle-like structure as the temperature is higher than 700°C. The magnetic behavior also switches from in-plane, through isotropy, and into out-of-plane directions. The heating rate and annealing temperature are the key effects on formation of Ll0 FePd (001), but not for the cooling rate and annealing time. In this study, the RTA process is an effective way to induce the tensile stress in biaxial a and b, resulting the shrinkage along c-axis and ordered FePd Ll0 (001) planes on glass. This paper shows a nonepitaxial method for Ll0 FePd (001) orientation growth on amorphous glass substrates.
Keywords :
cooling; crystal microstructure; iron alloys; magnetic hysteresis; magnetic switching; magnetic thin films; palladium alloys; perpendicular magnetic anisotropy; quenching (thermal); rapid thermal annealing; shrinkage; sputter deposition; surface morphology; tensile strength; (001) orientation growth; Fe52Pd48; RTA; SiO2; agglomeration; amorphous glass substrates; cooling; deposition; film thickness; furnace heating; heat treatment; magnetic isotropy; magnetic properties; magnetic switching; microstructure; morphology; nonepitaxial method; perpendicular magnetic anisotropy; quenching; rapid thermal annealing; shrinkage; size 10 nm; temperature 293 K to 298 K; temperature 600 degC to 900 degC; tensile stress; thin films; Amorphous magnetic materials; Annealing; Magnetic anisotropy; Magnetic hysteresis; Metals; Substrates; $L{rm l}_{0}$; FePd thin films; heat treatment; tensile stress;
fLanguage :
English
Journal_Title :
Magnetics, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9464
Type :
jour
DOI :
10.1109/TMAG.2013.2275193
Filename :
6693032
Link To Document :
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