DocumentCode
39523
Title
Impacts of Tapered Sidewall Profiles With High Aspect Ratio on Subwavelength Grating Structure
Author
Yu, Wenxi X. ; Yi, Y.
Author_Institution
Dearborn Campus, Univ. of Michigan, Dearborn, MI, USA
Volume
27
Issue
13
fYear
2015
fDate
July1, 1 2015
Firstpage
1437
Lastpage
1440
Abstract
We have numerically demonstrated the significant impacts on the resonance mode characteristics of subwavelength grating structures due to tapered sidewall profile and high aspect ratio, which is normally obtained due to the practical CMOS-compatible fabrication and etching processes. Our simulation results have revealed that the tapered sidewall profile with high aspect ratio plays important roles on the resonance mode behavior of subwavelength grating photonic devices. The coupling mechanism between the guided mode resonance and the grating cavity is also emphasized. Our numerical studies can be utilized for a series of integrated photonic devices applications, such as compact optical filter, photonic amplifier, and lasers, while considering realistic subwavelength grating structures due to current nanoelectronics fabrication process.
Keywords
diffraction gratings; etching; integrated optoelectronics; optical fabrication; optical waveguide theory; CMOS-compatible fabrication; aspect ratio; coupling mechanism; etching; grating cavity; guided mode resonance; integrated photonic devices; resonance mode characteristics; subwavelength grating photonic devices; subwavelength grating structure; tapered sidewall profiles; Cavity resonators; Couplings; Etching; Fabrication; Gratings; Optical filters; Photonics; Diffraction gratings; light enhancement; resonators; sub wavelength structures;
fLanguage
English
Journal_Title
Photonics Technology Letters, IEEE
Publisher
ieee
ISSN
1041-1135
Type
jour
DOI
10.1109/LPT.2015.2424596
Filename
7093148
Link To Document