• DocumentCode
    39523
  • Title

    Impacts of Tapered Sidewall Profiles With High Aspect Ratio on Subwavelength Grating Structure

  • Author

    Yu, Wenxi X. ; Yi, Y.

  • Author_Institution
    Dearborn Campus, Univ. of Michigan, Dearborn, MI, USA
  • Volume
    27
  • Issue
    13
  • fYear
    2015
  • fDate
    July1, 1 2015
  • Firstpage
    1437
  • Lastpage
    1440
  • Abstract
    We have numerically demonstrated the significant impacts on the resonance mode characteristics of subwavelength grating structures due to tapered sidewall profile and high aspect ratio, which is normally obtained due to the practical CMOS-compatible fabrication and etching processes. Our simulation results have revealed that the tapered sidewall profile with high aspect ratio plays important roles on the resonance mode behavior of subwavelength grating photonic devices. The coupling mechanism between the guided mode resonance and the grating cavity is also emphasized. Our numerical studies can be utilized for a series of integrated photonic devices applications, such as compact optical filter, photonic amplifier, and lasers, while considering realistic subwavelength grating structures due to current nanoelectronics fabrication process.
  • Keywords
    diffraction gratings; etching; integrated optoelectronics; optical fabrication; optical waveguide theory; CMOS-compatible fabrication; aspect ratio; coupling mechanism; etching; grating cavity; guided mode resonance; integrated photonic devices; resonance mode characteristics; subwavelength grating photonic devices; subwavelength grating structure; tapered sidewall profiles; Cavity resonators; Couplings; Etching; Fabrication; Gratings; Optical filters; Photonics; Diffraction gratings; light enhancement; resonators; sub wavelength structures;
  • fLanguage
    English
  • Journal_Title
    Photonics Technology Letters, IEEE
  • Publisher
    ieee
  • ISSN
    1041-1135
  • Type

    jour

  • DOI
    10.1109/LPT.2015.2424596
  • Filename
    7093148