DocumentCode :
396177
Title :
Modeling of diffusion process in p-n junction diode using matrix rational approximation
Author :
Tanji, Yuichi
Author_Institution :
Dept. of Reliability-based Inf. Syst. Eng., Kagawa Univ., Japan
Volume :
3
fYear :
2003
fDate :
25-28 May 2003
Abstract :
The diffusion process in p-n junction diodes is modeled using the matrix rational approximation. The diffusion process is governed by the carrier continuity equation which is equivalent to an RCG transmission line. The matrix rational approximation here is used to provide a lumped network model of the RCG transmission line preserving the passivity. In an example, comparable accuracy with mixed-level circuit and device simulation and superior efficiency to different passive models are observed.
Keywords :
carrier lifetime; electron-hole recombination; equivalent circuits; matrix algebra; p-n junctions; semiconductor device models; semiconductor diodes; transient response; transmission line theory; RCG transmission line; carrier continuity equation; carrier diffusion; carrier recombination; diffusion process modeling; lumped network model; matrix rational approximation; p-n junction diode; passivity preservation; Circuit simulation; Diffusion processes; Diodes; Distributed parameter circuits; Equations; P-n junctions; Predictive models; RLC circuits; Transmission line matrix methods; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Circuits and Systems, 2003. ISCAS '03. Proceedings of the 2003 International Symposium on
Print_ISBN :
0-7803-7761-3
Type :
conf
DOI :
10.1109/ISCAS.2003.1205062
Filename :
1205062
Link To Document :
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