DocumentCode :
397470
Title :
Riding the relational power wave to enhance the command, control & prompt reduction of monitoring wafer usage
Author :
Teo, Kok Lay ; Huang, Fay ; Wang, Jiacheng
fYear :
2003
fDate :
30 Sept.-2 Oct. 2003
Firstpage :
457
Lastpage :
460
Abstract :
The paper presents a method (named as the "Power" Concept) which quantifies the controlling & management of the necessary but relentingly high Monitor Wafer usages in the Wafer Fab. The objective is effective & prompt wafer usage reduction without losing the command and control of the wafers quantity & quality. This approach establishes the understanding & quantification on the impact of each well-intentioned input action taken. Quantifications are achieved by \´adding direction\´ to the Input Power(P), and thus riding and tapping on this Power(P) & not be overwhelmed by the problems of uncontrolled Power(P). Quantifiable anticipated results are the characteristics of this approach.
Keywords :
integrated circuit manufacture; process monitoring; production control; quality control; input power; monitor wafer usage; relational power wave; riding; wafer quality control; wafer quantity control; Command and control systems; Costs; Frequency; Gain control; Helicopters; Monitoring; Power generation; Pulp manufacturing; Recycling; Semiconductor device manufacture;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Manufacturing, 2003 IEEE International Symposium on
ISSN :
1523-553X
Print_ISBN :
0-7803-7894-6
Type :
conf
DOI :
10.1109/ISSM.2003.1243326
Filename :
1243326
Link To Document :
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