DocumentCode
398967
Title
High-index contrast Ge-doped silica waveguide technology: optical performance and application to ultralow-loss ring resonators
Author
Bourdon, G. ; Alibert, G. ; Beguin, A. ; Guiot, E. ; Bellman, R.
Author_Institution
Corning S.A., Avon, France
fYear
2003
fDate
23-28 March 2003
Firstpage
446
Abstract
We present a 3.5% index contrast Ge-doped silica planar technology with a propagation loss ≤0.10 dB/cm. This technology was used to fabricate ring resonators with a round-trip loss of 0.03 dB and a maximum FSR of 62.7 GHz.
Keywords
elemental semiconductors; germanium; optical fabrication; optical losses; optical planar waveguides; optical resonators; refractive index; silicon compounds; 0.03 dB; 62.7 GHz; Ge-doped silica waveguide; SiO2:Ge; fabrication; free spectral range; high-index contrast; optical performance; propagation loss; roundtrip loss; ultralow-loss ring resonators; Optical filters; Optical propagation; Optical refraction; Optical ring resonators; Optical variables control; Optical waveguides; Passive optical networks; Propagation losses; Silicon compounds; Switches;
fLanguage
English
Publisher
ieee
Conference_Titel
Optical Fiber Communications Conference, 2003. OFC 2003
Print_ISBN
1-55752-746-6
Type
conf
DOI
10.1109/OFC.2003.1248330
Filename
1248330
Link To Document