DocumentCode :
399123
Title :
In-situ etched buried heterostructures for uncooled and extended reach modulated lasers
Author :
Hinzer, K. ; Knight, G. ; Goodchild, D. ; Grevatt, T. ; Letal, G. ; Finlay, R. ; White, J.
Author_Institution :
Bookham Technol., Ottawa, Ont., Canada
fYear :
2003
fDate :
23-28 March 2003
Firstpage :
684
Abstract :
We report on in-situ etched and regrown buried heterostructure devices. Excellent surface morphology and reduction in surface damage lead to a 20% decrease in threshold current and 50% reduced burn-in degradation rates compared with standard processed devices.
Keywords :
optical fabrication; optical modulation; semiconductor lasers; burn-in degradation rate; extended reach modulated lasers; in-situ etched buried heterostructures; regrown buried heterostructures; standard processed devices; surface damage reduction; surface morphology; threshold current; uncooled modulated lasers; Bit error rate; Diode lasers; Dry etching; Electrons; Extinction ratio; Inductors; MOCVD; Power lasers; Quantum well devices; Temperature dependence;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Optical Fiber Communications Conference, 2003. OFC 2003
Print_ISBN :
1-55752-746-6
Type :
conf
DOI :
10.1109/OFC.2003.1248496
Filename :
1248496
Link To Document :
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