Title :
Low-losses coupled-lines silicon micromachined band-pass filters for the 45 GHz frequency band
Author :
Neculoiu, D. ; Bartolucci, G. ; Pons, P. ; Bary, L. ; Vasilache, D. ; Buiculescu, C. ; Vladoianu, F. ; Dragoman, M. ; Petrini, I. ; Muller, A. ; Plana, R.
Author_Institution :
IMT Bucharest, Romania
fDate :
28 Sept.-2 Oct. 2003
Abstract :
This paper presents the design, fabrication and testing of a micromachined coupled-lines band-pass filter for the 45 GHz frequency band. The design technique is based on identical symmetrical cells connected in cascade and image parameters representation of two-ports. The filter structures are fabricated using silicon reactive ion etching. The experimental characterization demonstrates transmission losses lower than 1 dB.
Keywords :
band-pass filters; elemental semiconductors; micromechanical devices; millimetre wave filters; silicon; sputter etching; 1 dB; 45 GHz; 45 GHz frequency band; Si; cascade; design; fabrication; identical symmetrical cells; image parameters; low-losses coupled-lines Si micromachined band-pass filters; reactive ion etching; testing; transmission losses; two-ports representation; Band pass filters; Biomembranes; Couplings; Fabrication; Frequency; Impedance; Micromachining; Millimeter wave technology; Silicon; Testing;
Conference_Titel :
Semiconductor Conference, 2003. CAS 2003. International
Print_ISBN :
0-7803-7821-0
DOI :
10.1109/SMICND.2003.1251356
