Additive lithography for micro and nano-photonic applications

This paper presents an alternative approach in fabricating micro-optics. This approach is compatible with conventional lithographic systems and can be applied to thick and thin photoresists. The advantage of the additive lithographic process lies in the ability to sculpt the photoresist in a single processing step. This eliminates the common alignment issues by containing all alignment to the stepper system. Precise control of the exposure does produces a multilevel element, which results in micro-optic components on the substrate after a single etching step. Holographic exposures can also be combined with conventional lithography for photonic crystal applications.