Title :
Progress in understanding of laser-produced plasmas for EUV source
Author :
Miyanaga, N. ; Fujima, K. ; Fujioka, S. ; Fujimoto, Y. ; Fujita, H. ; Furukawa, H. ; Hashimoto, K. ; Hibino, T. ; Kagawa, T. ; Kato, T. ; Kawamura, T. ; Koike, F. ; Matsui, R. ; More, R. ; Murakami, M. ; Nagai, K. ; Nakai, M. ; Nakatsuka, M. ; Nishikawa,
Author_Institution :
Inst. of Laser Eng., Osaka Univ., Japan
Abstract :
Our research aims at the physical understanding of laser-produced plasma (LPP) as an EUV source for lithography. To provide a database of EUV source this comprehensive research includes high performance laser development, target fabrication, plasma experiments, theory and simulations. We will report present progress of each subject, particularly recent experimental results of Sn and SnO2 targets and comparison with computer simulations.
Keywords :
plasma production by laser; plasma simulation; ultraviolet lithography; ultraviolet sources; EUV source; EUV source database; Sn target; SnO2 target; high performance laser development; laser-produced plasmas; lithography; plasma experiments; plasma simulations; plasma theory; target fabrication; Atomic beams; Atomic measurements; Laser fusion; Laser modes; Laser theory; Plasma measurements; Plasma simulation; Plasma sources; Tin; Wavelength measurement;
Conference_Titel :
Lasers and Electro-Optics Society, 2003. LEOS 2003. The 16th Annual Meeting of the IEEE
Print_ISBN :
0-7803-7888-1
DOI :
10.1109/LEOS.2003.1251755
