DocumentCode :
400387
Title :
Germanium on double-SOI photodetectors for 1550 nm operation
Author :
Dosunmu, Olufemi ; Emsley, Matthew K. ; Cannon, Douglas D. ; Ghyselen, Bruno ; Kimerling, Lionel C. ; Ünlü, M. Selim
Author_Institution :
Dept. of Electr. & Comput. Eng., Boston Univ., MA, USA
Volume :
2
fYear :
2003
fDate :
27-28 Oct. 2003
Firstpage :
853
Abstract :
In this paper, we have fabricated a resonant cavity enhanced (RCE) Ge-on-double-silicon on insulator (SOI) photodetector for operation around the 1550 nm communication wavelength. The enhanced response of this detector is attributed to both the resonant cavity effect as well as the strain induced band gap narrowing of the Ge layer.
Keywords :
cavity resonators; elemental semiconductors; energy gap; germanium; optical communication equipment; optical fabrication; photodetectors; silicon compounds; silicon-on-insulator; 1550 nm; SOI; Si; SiO2-Si-Ge; communication wavelength; double-silicon-on-insulator photodetector fabrication; germanium layer; resonant cavity; strain induced band gap narrowing; Absorption; Detectors; Distributed Bragg reflectors; Germanium; Lattices; Materials science and technology; Mirrors; Photodetectors; Photonic band gap; Resonance;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics Society, 2003. LEOS 2003. The 16th Annual Meeting of the IEEE
ISSN :
1092-8081
Print_ISBN :
0-7803-7888-1
Type :
conf
DOI :
10.1109/LEOS.2003.1253069
Filename :
1253069
Link To Document :
بازگشت