DocumentCode :
400391
Title :
Outlook of low temperature poly silicon (LTPS) technology for information display and beyond
Author :
Wu, I-Wei
Author_Institution :
Toppoly Optoelectron. Corp., Chu-Nan, Taiwan
Volume :
2
fYear :
2003
fDate :
27-28 Oct. 2003
Firstpage :
882
Abstract :
This paper examined several key technologies and their advances involved in the use of p-Si TFTs for AMLCDs. While the technologies required to build p-Si TFTs on large area substrates are less mature than those used to build a-Si devices, rapid progress is being made. The approaches to low cost, high performance p-Si TFTs which will meet the future requirements will be dictated by the LCD product requirements. By combining these technologies, LTPS will be the devices of choice for high resolution LCDs as well as the possibility of increased functionality on large area substrates with intriguing system opportunities.
Keywords :
elemental semiconductors; liquid crystal displays; silicon; thin film transistors; LCD; Si; Si device; information display; liquid crystal displays; low temperature poly silicon technology; p-Si TFT; thin film transistor; Circuits; Costs; Geometry; Glass; Liquid crystal displays; Organic light emitting diodes; Silicon; Tellurium; Temperature; Thin film transistors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics Society, 2003. LEOS 2003. The 16th Annual Meeting of the IEEE
ISSN :
1092-8081
Print_ISBN :
0-7803-7888-1
Type :
conf
DOI :
10.1109/LEOS.2003.1253084
Filename :
1253084
Link To Document :
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