Title :
ENCOTION - A new simulation tool for energetic contamination analysis
Author :
Haublein, V. ; Frey, Lothar ; Ryssel, H.
Abstract :
Experience shows that in spite of mass separation, undesired ions originating from the source chamber can be implanted energetically into a wafer. Charge exchange events and dissociation of molecular ions prior to mass analysis are the main reasons why contaminants are able to fulfill the magnetic rigidity requirements for transmission. The software tool, ENCOTION (ENergetic COntamination simulaTION) simulates the potential transport mechanisms that allow undesired ions to pass through the analyzer magnet. ENCOTION is used to evaluate the contamination potential of any element and to identify transport mechanisms of contaminants in combination with experimentally determined contamination profiles. In this paper, ENCOTION is discussed in detail and its application is demonstrated in an example.
Keywords :
doping profiles; ion implantation; semiconductor doping; ENCOTION; ENergetic COntamination simulaTION; charge exchange events; energetic contamination analysis; mass separation; molecular ions dissociation; simulation tool; Acceleration; Analytical models; Contamination; Implants; Magnetic analysis; Magnetic flux; Magnetic materials; Magnetic separation; Software tools; Voltage;
Conference_Titel :
Ion Implantation Technology. 2002. Proceedings of the 14th International Conference on
Conference_Location :
Taos, New Mexico, USA
Print_ISBN :
0-7803-7155-0
DOI :
10.1109/IIT.2002.1257977