• DocumentCode
    400904
  • Title

    Report on in-situ antimony fluoride generation for ion implant processes

  • Author

    Arno, J.

  • fYear
    2002
  • fDate
    27-27 Sept. 2002
  • Firstpage
    452
  • Lastpage
    454
  • Abstract
    The in-situ formation of antimony fluorides in a continuous flow reactor was investigated. Molecular fluorine was delivered from a VAC™ cylinder into heated reactor packed with antimony metal. The post-reactor pressure was monitored and effluent species were measured using IR and mass spectroscopic techniques. Complete fluorine utilization was achieved when operating at temperatures greater than 160°C. The data suggests that the antimony and fluorine reaction formed antimony (III) fluoride or SbxFy clusters with boiling points greater 250°C. The report also includes recommendations for implementing this technology for ion implant applications.
  • Keywords
    antimony compounds; infrared spectra; ion implantation; ion sources; mass spectroscopy; semiconductor doping; 160 degC; 250 degC; IR spectroscopic techniques; SbxFy; SbFx; VAC™ cylinder; continuous flow reactor; heated reactor; in-situ formation; ion implant processes; mass spectroscopic techniques; post-reactor pressure; Assembly; Bellows; Fault location; Fluid flow; Implants; Inductors; Regulators; Safety; Testing; Valves;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Ion Implantation Technology. 2002. Proceedings of the 14th International Conference on
  • Conference_Location
    Taos, New Mexico, USA
  • Print_ISBN
    0-7803-7155-0
  • Type

    conf

  • DOI
    10.1109/IIT.2002.1258038
  • Filename
    1258038