DocumentCode :
400911
Title :
orig-research
Author :
Sweeney, Joseph ; Arno, J. ; Faller, R. ; Marganski, P. ; Ramirez, Claudio ; Dunn, James
fYear :
2002
fDate :
27-27 Sept. 2002
Firstpage :
479
Lastpage :
482
Abstract :
A small, zero-footprint, passive chemisorption scrubber (Novasafe) has been developed to treat the effluent from ion implanters. Extensive laboratory testing dictated a dual bed unit with a diameter of 10" and a height of 12". Evaluation in a production environment indicated that scrubber lifetime varied with implanter type. The units lasted approximately 6-9 months when servicing high current implanters, and lasted in excess of one year when servicing medium current implanters. The failure mechanism on high current implanters was due to increased pressure drop resulting from solids accumulation.
Keywords :
environmental factors; ion implantation; semiconductor doping; Novasafe; dual bed unit; effluent; failure mechanism; ion implant; passive chemisorption scrubber; zero footprint dry scrubber; Boron; Chemicals; Costs; Effluents; Gases; Implants; Laboratories; Resins; Silicon; Testing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Ion Implantation Technology. 2002. Proceedings of the 14th International Conference on
Conference_Location :
Taos, New Mexico, USA
Print_ISBN :
0-7803-7155-0
Type :
conf
DOI :
10.1109/IIT.2002.1258045
Filename :
1258045
Link To Document :
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