Title :
An effective scheme for the application of a life safety system for the entire ion implant module
Author :
Rivera, N. ; Sherrett, M. ; Mayer, Jonas
Abstract :
An ion implantation fab module uses some of the most toxic materials within a given fab site. The paper discusses an optimum approach to cover an entire module as well as the details of using the proper monitoring technology to confidently detect gas materials such as arsine, phosphine, boron trifluoride, silicon tetrafluoride and germanium tetrafluoride. Feedback from user sites will be cited as to the success of this application.
Keywords :
environmental factors; ion implantation; safety; semiconductor doping; AsH3; BF3; GeF4; PH3; SiF4; arsine; boron trifluoride; entire ion implant module; germanium tetrafluoride; life safety system; monitoring technology; phosphine; silicon tetrafluoride; toxic materials; Gas detectors; Gases; Implants; Intelligent sensors; Ion implantation; Monitoring; Safety; Satellites; Sensor systems; Transceivers;
Conference_Titel :
Ion Implantation Technology. 2002. Proceedings of the 14th International Conference on
Conference_Location :
Taos, New Mexico, USA
Print_ISBN :
0-7803-7155-0
DOI :
10.1109/IIT.2002.1258047
