DocumentCode
400914
Title
Process performance of the ULVAC IW-630 200/300mm implanter
Author
Rhoad, T. ; Lovelace, B. ; Suzuki, Hajime ; Niikura, K. ; McLaughlin, T.
fYear
2002
fDate
27-27 Sept. 2002
Firstpage
491
Lastpage
494
Abstract
The process performance for ULVAC´s IW-630 200/300 mm medium current ion implanter is reviewed. The IW-630 was designed to ensure high beam parallelism, high-energy purity, and low defect contamination through the use of a ground magnet. The analyses presented include beam parallelism, energy purity, particle contamination, metals contamination, dose uniformity and repeatability.
Keywords
focused ion beam technology; ion implantation; particle beam diagnostics; semiconductor doping; 200 mm; 300 mm; ULVAC IW-630 200/300mm implanter; beam parallelism; dose uniformity; energy purity; ground magnet; high beam parallelism; high-energy purity; low defect contamination; medium current ion implanter; metals contamination; particle contamination; process performance; repeatability; Acceleration; Contamination; Implants; Ion sources; Magnetic analysis; Magnetic separation; Optical filters; Optical pumping; Particle beam optics; Particle beams;
fLanguage
English
Publisher
ieee
Conference_Titel
Ion Implantation Technology. 2002. Proceedings of the 14th International Conference on
Conference_Location
Taos, New Mexico, USA
Print_ISBN
0-7803-7155-0
Type
conf
DOI
10.1109/IIT.2002.1258048
Filename
1258048
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