DocumentCode
400917
Title
Capacity increase for existing Varian EHP220 and EHP500 implanters
Author
Ali, K.X.
fYear
2002
fDate
27-27 Sept. 2002
Firstpage
505
Lastpage
506
Abstract
Wafer throughput is of great importance to the semiconductor production facility. The problems of financial and spatial considerations magnified by aging fabs and industry downturns are directing focus to improving existing capacity and away from purchasing new tools. Wafer handler hardware upgrades, software upgrades, and improved operation procedures were implemented on three Varian EHP-220 implanters and one EHP-500 implanter to achieve higher capacity. This was accomplished without adversely affecting implant process parameters, tool uptime, or product uniformity. This paper presents two stages of improvements along with the data for corresponding increase in tool capacity and retention of tool and process reliability.
Keywords
ion implantation; semiconductor doping; semiconductor technology; EHP500 implanters; Varian EHP220 implanters; capacity increase; computer memory industry; fab capacity; implant process parameters; operation procedures; process reliability; product uniformity; semiconductor production facility; software upgrades; tool capacity; tool uptime; wafer handler hardware upgrades; wafer throughput; Feedback; Hardware; Implants; Infrared sensors; Monitoring; Production facilities; Software systems; Software tools; Synthetic aperture sonar; Throughput;
fLanguage
English
Publisher
ieee
Conference_Titel
Ion Implantation Technology. 2002. Proceedings of the 14th International Conference on
Conference_Location
Taos, New Mexico, USA
Print_ISBN
0-7803-7155-0
Type
conf
DOI
10.1109/IIT.2002.1258052
Filename
1258052
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