• DocumentCode
    400917
  • Title

    Capacity increase for existing Varian EHP220 and EHP500 implanters

  • Author

    Ali, K.X.

  • fYear
    2002
  • fDate
    27-27 Sept. 2002
  • Firstpage
    505
  • Lastpage
    506
  • Abstract
    Wafer throughput is of great importance to the semiconductor production facility. The problems of financial and spatial considerations magnified by aging fabs and industry downturns are directing focus to improving existing capacity and away from purchasing new tools. Wafer handler hardware upgrades, software upgrades, and improved operation procedures were implemented on three Varian EHP-220 implanters and one EHP-500 implanter to achieve higher capacity. This was accomplished without adversely affecting implant process parameters, tool uptime, or product uniformity. This paper presents two stages of improvements along with the data for corresponding increase in tool capacity and retention of tool and process reliability.
  • Keywords
    ion implantation; semiconductor doping; semiconductor technology; EHP500 implanters; Varian EHP220 implanters; capacity increase; computer memory industry; fab capacity; implant process parameters; operation procedures; process reliability; product uniformity; semiconductor production facility; software upgrades; tool capacity; tool uptime; wafer handler hardware upgrades; wafer throughput; Feedback; Hardware; Implants; Infrared sensors; Monitoring; Production facilities; Software systems; Software tools; Synthetic aperture sonar; Throughput;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Ion Implantation Technology. 2002. Proceedings of the 14th International Conference on
  • Conference_Location
    Taos, New Mexico, USA
  • Print_ISBN
    0-7803-7155-0
  • Type

    conf

  • DOI
    10.1109/IIT.2002.1258052
  • Filename
    1258052