DocumentCode :
400941
Title :
Structural and electronic properties of Fe+ implanted Cr films
Author :
Heck, C. ; Chayahara, A. ; Horino, Y. ; Funahashi, R. ; Miranda, R.M.N. ; Baibich, M.N.
fYear :
2002
fDate :
27-27 Sept. 2002
Firstpage :
622
Lastpage :
624
Abstract :
The present work deals with magnetic immiscible metals, i.e., Fe-Cr, analyzing the effect of implantation on the structure of this system and its transport properties. We have produced Cr films that, by either deposition or ion implantation had included one or two Fe-rich legions, with subsequent annealing being performed in some cases. The resulting structure and transport properties have been analyzed.
Keywords :
Kondo effect; annealing; antiferromagnetic materials; chromium; discontinuous metallic thin films; electrical resistivity; ion implantation; iron; magnetic thin films; Cr:Fe; Fe-rich regions; Kondo effect; X-ray diffraction; annealing; antiferromagnetic matrix; granular films; ion implantation effect; magnetic immiscible metals; magnetic nanostructures; resistivity; segregation; transmission electron microscopy; transport properties; Argon; Chromium; Giant magnetoresistance; Inorganic materials; Iron; Magnetic films; Magnetic materials; Magnetic properties; Materials science and technology; Nanostructured materials;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Ion Implantation Technology. 2002. Proceedings of the 14th International Conference on
Conference_Location :
Taos, New Mexico, USA
Print_ISBN :
0-7803-7155-0
Type :
conf
DOI :
10.1109/IIT.2002.1258082
Filename :
1258082
Link To Document :
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