DocumentCode
402397
Title
Oxidation effect on the loss characteristics of CPWs implemented on low resistivity substrate with thick Oxidized Porous Silicon (OPS) layer
Author
Ha, Man-Lyun ; Shin, Seong-Ho ; Kim, Moon-Jung ; Ko, Ju-Hyun ; Kwon, Young-Se
Author_Institution
Dept. of Electr. Eng. & Comput. Sci., Korea Adv. Inst. of Sci. & Technol., Daejon, South Korea
Volume
3
fYear
2003
fDate
7-9 Oct. 2003
Firstpage
1311
Abstract
Using the general MMIC fabrication process, Coplanar waveguides were implemented on Oxidized Porous Silicon, which were oxidized at several temperature. The effect of oxidation temperature on the loss of CPWs was presented and the loss was decreased with increasing oxidation temperature. These characteristics result from the transformation rate of porous silicon to the thick oxide layer. When the signal line width and spacing were 40 μm and 5 μm, respectively, the insertion loss was about 0.25 dB/mm at 18 GHz, which was oxidized at 1060°C with wet O2.
Keywords
coplanar waveguides; gold; oxidation; titanium; 1060 degC; 18 GHz; 40 micron; 5 micron; CPW; MMIC fabrication; Si; Ti-Au; oxidation effect; oxidized porous silicon layer; signal line width; wet oxygen; Conductivity; Coplanar waveguides; Inductors; Moisture; Oxidation; Performance loss; Radio frequency; Radiofrequency integrated circuits; Silicon; Temperature;
fLanguage
English
Publisher
ieee
Conference_Titel
Microwave Conference, 2003. 33rd European
Print_ISBN
1-58053-834-7
Type
conf
DOI
10.1109/EUMC.2003.1262899
Filename
1262899
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