Title :
Placement using a localization probability model (LPM)
Author :
Olbrich, Markus ; Barke, Erich
Author_Institution :
Inst. of Microelectron. Syst., EDA Group, Hannover, Germany
Abstract :
We propose a new placement model for global placement. This model uses probabilities to localize the cells. It enables arbitrary levels of placement abstraction. Wire-length estimations at any level can be derived from the model. We present a new placer, that uses a special variant of the proposed model. Examples show that the model properties improve placement quality.
Keywords :
cellular arrays; circuit layout CAD; circuit optimisation; integrated circuit layout; probability; cell localization; circuit layout CAD; computer aided design; global placement; integrated circuit layout; localization probability model; placement abstraction; probability; wire length estimations; Analytical models; Circuit simulation; Clustering algorithms; Design automation; Electronic design automation and methodology; Microelectronics; Partitioning algorithms; Runtime; Simulated annealing; Very large scale integration;
Conference_Titel :
Design, Automation and Test in Europe Conference and Exhibition, 2004. Proceedings
Print_ISBN :
0-7695-2085-5
DOI :
10.1109/DATE.2004.1269112