• DocumentCode
    404149
  • Title

    Analytical threshold voltage model for design and evaluation of tri-gate MOSFETs

  • Author

    Zeng, C. ; Barlage, D.W.

  • Author_Institution
    Dept. of Electr. & Comput. Eng., North Carolina State Univ., Raleigh, NC, USA
  • fYear
    2003
  • fDate
    10-12 Dec. 2003
  • Firstpage
    232
  • Lastpage
    233
  • Abstract
    A framework for assessing fundamental device properties of tri-gate device is presented. The dynamics of the threshold voltage calculation is evaluated for the tri-gate architecture of device. Limited comparison to double gate device is also presented.
  • Keywords
    MOSFET; semiconductor device models; analytical threshold voltage model; double gate device; tri-gate MOSFET design; tri-gate MOSFET evaluation; tri-gate device; Analytical models; Data analysis; Density measurement; Insulation; MOSFETs; Manufacturing processes; Poisson equations; Silicon; Threshold voltage; Transistors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Device Research Symposium, 2003 International
  • Print_ISBN
    0-7803-8139-4
  • Type

    conf

  • DOI
    10.1109/ISDRS.2003.1272075
  • Filename
    1272075