DocumentCode :
404161
Title :
Time-resolved measurements of self-heating in SOI and strained-Si MOSFETs using off-state leakage current luminescence
Author :
Polonsky, Stas ; Jenkins, Keith A.
Author_Institution :
IBM Thomas J. Watson Res. Center, Yorktown Heights, NY, USA
fYear :
2003
fDate :
10-12 Dec. 2003
Firstpage :
359
Lastpage :
360
Abstract :
A new non-invasive optical technique is used to measure time-resolved temperature of advanced CMOS FETs. The technique uses time-resolved photon emission microscopy to measure the temperature-dependent luminescence of off-state leakage current. The method measures the temperature of the device channel, independent of surrounding materials or interconnects. The technique has been used to measure, for the first time, self-heating dynamics in SOI and strained-Si nFETs.
Keywords :
MOSFET; elemental semiconductors; leakage currents; luminescence; silicon; silicon-on-insulator; CMOS FET; SOI; Si; noninvasive optical technique; off state leakage current luminescence; self-heating dynamics; silicon-on-insulator; strained Si nMOSFET; temperature dependent luminescence; time resolved photon emission microscopy; time resolved temperature measurements; Current measurement; FETs; Leakage current; Luminescence; MOSFETs; Microscopy; Optical interconnections; Optical materials; Stimulated emission; Temperature measurement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Device Research Symposium, 2003 International
Print_ISBN :
0-7803-8139-4
Type :
conf
DOI :
10.1109/ISDRS.2003.1272135
Filename :
1272135
Link To Document :
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