DocumentCode
405490
Title
Enhanced PL of high density (≈4.7×1011/cm2) InAs QDs by using graded interface of GaAs/AlAs/GaAs
Author
Park, S.K. ; Tatebayashi, J. ; Arakawa, Y.
Author_Institution
Inst. of Ind. Sci., Tokyo Univ., Japan
Volume
1
fYear
2003
fDate
15-19 Dec. 2003
Abstract
We have achieved an enhanced PL of high density (≈4.7×1011/cm2) InAs QDs by using graded interface of GaAs/AlAs/GaAs. The graded interface applied for the purpose of improving surface state helps to obtain high intensity PL spectra of InAs QDs. With increasing the number of graded interface, the intensity of PL emitted from InAs QDs is increased. From the results, we conclude that the graded interface is a key point of fabricating devices, which have high optical properties.
Keywords
III-V semiconductors; aluminium compounds; gallium arsenide; indium compounds; optical fabrication; photoluminescence; semiconductor quantum dots; GaAs-AlAs-GaAs; InAs; enhanced PL; graded interface; high density InAs QD; Gallium arsenide; Optical surface waves; Quantum dots; Temperature dependence;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics, 2003. CLEO/Pacific Rim 2003. The 5th Pacific Rim Conference on
Print_ISBN
0-7803-7766-4
Type
conf
DOI
10.1109/CLEOPR.2003.1274730
Filename
1274730
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