• DocumentCode
    405491
  • Title

    Effects of film deposition rate and thermal annealing on optical and microstructural evolution of amorphous Ta2O5 and SiO2 films

  • Author

    Liu, Wen-Jen ; Chien, Chia-Hung

  • Author_Institution
    Dept. of Mater. Sci. & Eng., I-Shou Univ., Kaohsiung, Taiwan
  • Volume
    1
  • fYear
    2003
  • fDate
    15-19 Dec. 2003
  • Abstract
    The influences of deposition rate and thermal annealing for the surface roughness, optical properties, and microstructural evolution of single SiO2 and Ta2O5 thin films on the D263T quartz glass substrate by using plasma ion assisted deposition (PIAD) were investigated.
  • Keywords
    amorphous state; annealing; ion beam assisted deposition; optical films; optical glass; plasma deposited coatings; quartz; silicon compounds; substrates; surface roughness; tantalum compounds; thin films; D263T quartz glass substrate; SiO2 films; Ta2O5; amorphous Ta2O5 thin films; film deposition rate; optical property; plasma ion assisted deposition; surface roughness; thermal annealing; Amorphous materials; Annealing; Glass; Optical films; Particle beam optics; Plasma properties; Rough surfaces; Sputtering; Substrates; Surface roughness;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics, 2003. CLEO/Pacific Rim 2003. The 5th Pacific Rim Conference on
  • Print_ISBN
    0-7803-7766-4
  • Type

    conf

  • DOI
    10.1109/CLEOPR.2003.1274731
  • Filename
    1274731
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=405491