Title :
Effects of film deposition rate and thermal annealing on optical and microstructural evolution of amorphous Ta2O5 and SiO2 films
Author :
Liu, Wen-Jen ; Chien, Chia-Hung
Author_Institution :
Dept. of Mater. Sci. & Eng., I-Shou Univ., Kaohsiung, Taiwan
Abstract :
The influences of deposition rate and thermal annealing for the surface roughness, optical properties, and microstructural evolution of single SiO2 and Ta2O5 thin films on the D263T quartz glass substrate by using plasma ion assisted deposition (PIAD) were investigated.
Keywords :
amorphous state; annealing; ion beam assisted deposition; optical films; optical glass; plasma deposited coatings; quartz; silicon compounds; substrates; surface roughness; tantalum compounds; thin films; D263T quartz glass substrate; SiO2 films; Ta2O5; amorphous Ta2O5 thin films; film deposition rate; optical property; plasma ion assisted deposition; surface roughness; thermal annealing; Amorphous materials; Annealing; Glass; Optical films; Particle beam optics; Plasma properties; Rough surfaces; Sputtering; Substrates; Surface roughness;
Conference_Titel :
Lasers and Electro-Optics, 2003. CLEO/Pacific Rim 2003. The 5th Pacific Rim Conference on
Print_ISBN :
0-7803-7766-4
DOI :
10.1109/CLEOPR.2003.1274731
