DocumentCode
409159
Title
Insertion device vacuum chamber for the Linac Coherent Light Source
Author
Lee, Soon-Hong ; Trakhtenberg, Emil ; Den Hartog, Patric
Author_Institution
Adv. Photon Source, Argonne Nat. Lab., IL, USA
Volume
2
fYear
2003
fDate
12-16 May 2003
Firstpage
824
Abstract
The vacuum requirement for the undulator line of the Linac Coherent Light Source is extremely challenging: a low resistive wall impedance 3.42-m-long chamber that fits within a 6.3 mm undulator gap that has ultralow outgassing and a surface finish, less than 100 nm Ra. A prototype chamber will be fabricated from electropolished semiconductor-processing-grade stainless-steel seamless tubing. Since stainless-steel tubing has a high electric resistivity, which can increase the resistive wall wake, a thin layer of copper will be deposited to minimize this effect. A thin nickel plating will be deposited in advance for better adhesion. This process will be followed by electropolishing of the copper surface. The first approach for Cu coating of the vacuum chamber has been investigated. Roughness measurements and preliminary coating results with a one-meter-long tube will be presented.
Keywords
electron accelerators; linear accelerators; vacuum apparatus; 3.42 m; 6.3 mm; Linac Coherent Light Source; copper surface; electropolished semiconductor-processing-grade stainless-steel seamless tubing; high electric resistivity; insertion device vacuum chamber; outgassing; prototype chamber; resistive wall impedance; resistive wall wake; thin nickel plating; undulator gap; undulator line; Coatings; Copper; Electric resistance; Light sources; Linear particle accelerator; Nickel; Prototypes; Surface finishing; Surface impedance; Undulators;
fLanguage
English
Publisher
ieee
Conference_Titel
Particle Accelerator Conference, 2003. PAC 2003. Proceedings of the
ISSN
1063-3928
Print_ISBN
0-7803-7738-9
Type
conf
DOI
10.1109/PAC.2003.1289490
Filename
1289490
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