A novel micromachined magnetostrictive delay line (MDL) with electroplated amorphous magnetostrictive thin film

Author

Rong, Rong ; Ahn, Chong H.

Author_Institution

Dept. of Electr. & Comput. Eng. & Comput. Sci., Cincinnati Univ., OH, USA

fYear

2004

fDate

2004

Firstpage

580

Lastpage

583

Abstract

A novel micromachined magnetostrictive delay line (MDL) employing electroplated thin film with high saturation magnetostriction coefficient has been proposed, fabricated and characterized in this work. The realized micro MDL consists of two micromachined coils and the electroplated magnetostrictive thin film working as a delay medium. The electroplated magnetostrictive FeB thin film with a thickness of 1μm has a high saturation magnetostriction (λ_s=54×10^-6). Compared to sputtering, electrodepositing method is cheap, convenient, and compatible with MEMS fabrication process. The developed micro MDL shows excellent delay characteristics, so it can be used as a basic principle for various new microsensors.

Keywords

amorphous state; boron alloys; electroplated coatings; iron alloys; magnetic thin films; magnetostrictive devices; micromechanical devices; 1 micron; FeB; MEMS fabrication process; electrodepositing method; electroplated amorphous magnetostrictive thin film; magnetostriction coefficient; microelectromechanical systems; micromachined coils; micromachined magnetostrictive delay line; microsensors; sputtering; Amorphous magnetic materials; Amorphous materials; Coils; Delay lines; Fabrication; Magnetostriction; Micromechanical devices; Saturation magnetization; Sputtering; Transistors;

fLanguage

English

Publisher

ieee

Conference_Titel

Micro Electro Mechanical Systems, 2004. 17th IEEE International Conference on. (MEMS)

Print_ISBN

0-7803-8265-X

Type

conf

DOI

10.1109/MEMS.2004.1290651

Filename

1290651