Title :
A novel micromachined magnetostrictive delay line (MDL) with electroplated amorphous magnetostrictive thin film
Author :
Rong, Rong ; Ahn, Chong H.
Author_Institution :
Dept. of Electr. & Comput. Eng. & Comput. Sci., Cincinnati Univ., OH, USA
Abstract :
A novel micromachined magnetostrictive delay line (MDL) employing electroplated thin film with high saturation magnetostriction coefficient has been proposed, fabricated and characterized in this work. The realized micro MDL consists of two micromachined coils and the electroplated magnetostrictive thin film working as a delay medium. The electroplated magnetostrictive FeB thin film with a thickness of 1μm has a high saturation magnetostriction (λs=54×10-6). Compared to sputtering, electrodepositing method is cheap, convenient, and compatible with MEMS fabrication process. The developed micro MDL shows excellent delay characteristics, so it can be used as a basic principle for various new microsensors.
Keywords :
amorphous state; boron alloys; electroplated coatings; iron alloys; magnetic thin films; magnetostrictive devices; micromechanical devices; 1 micron; FeB; MEMS fabrication process; electrodepositing method; electroplated amorphous magnetostrictive thin film; magnetostriction coefficient; microelectromechanical systems; micromachined coils; micromachined magnetostrictive delay line; microsensors; sputtering; Amorphous magnetic materials; Amorphous materials; Coils; Delay lines; Fabrication; Magnetostriction; Micromechanical devices; Saturation magnetization; Sputtering; Transistors;
Conference_Titel :
Micro Electro Mechanical Systems, 2004. 17th IEEE International Conference on. (MEMS)
Print_ISBN :
0-7803-8265-X
DOI :
10.1109/MEMS.2004.1290651
