Title :
Super-resolution by nonlinear optical lithography
Author :
Bentley, Sean J. ; Boyd, Robert W.
Author_Institution :
Inst. of Opt., Rochester Univ., NY, USA
Abstract :
A method for improving the resolution of a lithographic system by an arbitrary amount (with no visibility reduction for incoherent mask methods) is proposed and demonstrated experimentally. The method simply relies on the sharpened features available through N-photon detection.
Keywords :
masks; multiphoton processes; nonlinear optics; optical sensors; photolithography; N-photon detection; incoherent mask method; lithographic system; nonlinear optical lithography; super-resolution; visibility reduction; Charge coupled devices; Detectors; Image generation; Interferometric lithography; Neodymium; Nonlinear optics; Optical diffraction; Optical imaging; Optical interferometry; Phased arrays;
Conference_Titel :
Lasers and Electro-Optics, 2003. CLEO '03. Conference on
Conference_Location :
Baltimore, MD, USA
Print_ISBN :
1-55752-748-2
