DocumentCode
411854
Title
Controlling the feature size made by two-photon photopolymerization in a threshold material
Author
Chang, Ting-Wei ; Mong, Hong-Yao ; Jiunn-Yuan Lin ; Wang, Jyhpyng ; Lee, Chau-Hwang
Author_Institution
Graduate Inst. of Phys., Nat. Chung Chen Univ., Chia-Yi, Taiwan
fYear
2003
fDate
6-6 June 2003
Abstract
The feature size made by two-photon photopolymerization is described by a threshold model. In a negative photoresist SU-8 we show the linewidth fabricated by this nonlinear process is consistent with the prediction of this model.
Keywords
diffraction gratings; optical elements; optical fabrication; optical materials; optical polymers; photochemistry; photoresists; polymerisation; size control; two-photon processes; feature size control; linewidth fabrication; negative photoresist SU-8; nonlinear process; threshold material; two-photon photopolymerization; Absorption; Gratings; Laser beams; Laser modes; Optical pulses; Physics; Polymers; Power lasers; Resists; Size control;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics, 2003. CLEO '03. Conference on
Conference_Location
Baltimore, MD, USA
Print_ISBN
1-55752-748-2
Type
conf
Filename
1298001
Link To Document