Title :
Ultra-high resolution index of refraction profiles of femtosecond laser modified silica structures
Author :
Taylor, R.S. ; Hnatovsky, C. ; Simova, E. ; Rayner, D.M. ; Bhardwaj, V.R. ; Corkum, P.B.
Author_Institution :
Inst. for Microstructural Sci., Nat. Res. Council of Canada, Ottawa, Ont., Canada
Abstract :
Ultra-high spatial resolution index of refraction profiles of femtosecond laser modified structures in silica glass have been measured using the combination of chemical etching and atomic force microscopy.
Keywords :
amorphous semiconductors; atomic force microscopy; etching; high-speed optical techniques; light refraction; optical glass; silicon compounds; SiO/sub 2/; atomic force microscopy; chemical etching; femtosecond laser; modified silica structure; refraction profile; silica glass; ultra-high spatial resolution index; Atom lasers; Atomic force microscopy; Atomic measurements; Chemical lasers; Etching; Force measurement; Glass; Optical refraction; Silicon compounds; Spatial resolution;
Conference_Titel :
Lasers and Electro-Optics, 2003. CLEO '03. Conference on
Conference_Location :
Baltimore, MD, USA
Print_ISBN :
1-55752-748-2
