DocumentCode :
41231
Title :
Low-Voltage Steep Turn-On pMOSFET Using Ferroelectric High- \\kappa Gate Dielectric
Author :
Chun Hu Cheng ; Chin, Alvin
Author_Institution :
Dept. of Mechatron. Technol., Nat. Taiwan Normal Univ., Taipei, Taiwan
Volume :
35
Issue :
2
fYear :
2014
fDate :
Feb. 2014
Firstpage :
274
Lastpage :
276
Abstract :
Power consumption is the most difficult challenge for CMOS integrated circuits. Here, we demonstrate experimentally a novel steep turn-on pMOSFET for low-voltage operation for the first time, which exhibits 5-60 mV/decade SS, wide voltage range for , sturdy SS at 85°C, faster transistor turn-on at above threshold voltage, and lower off-state leakage by greater than three orders of magnitude. Such improved leakage current is crucial to decrease the OFF-state leakage current in sub-1X nm CMOS. This was achieved using ferroelectric high-κ ZrHfO gate dielectric pMOSFET.
Keywords :
MOSFET; ferroelectric materials; high-k dielectric thin films; low-power electronics; zirconium compounds; ZrHfO; fast transistor turn-on; ferroelectric high-K gate dielectric; low voltage operation; low voltage pMOSFET; off-state leakage; steep turn-on pMOSFET; temperature 85 C; threshold voltage; Dielectric measurement; Dielectrics; Leakage currents; Logic gates; MOSFET; MOSFET circuits; Ferroelectric; ZrHfO; sub-threshold swing; transistor;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2013.2291560
Filename :
6693802
Link To Document :
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