DocumentCode :
412952
Title :
Effect of the membrane flatness defect on the offset voltage of a silicon piezoresistive pressure sensor
Author :
Dibi, Z. ; Boukabache, A. ; Pons, P.
Author_Institution :
Departement d´´Electronique, Univ. de Batna, Algeria
Volume :
2
fYear :
2003
fDate :
14-17 Dec. 2003
Firstpage :
902
Abstract :
In this paper, we study the effect of the membrane sides parallelism defect on the offset voltage of a silicon piezoresistive pressure sensor. The study is based on an experimental profile plot of the membrane bottom of 30 μm thickness realised in LAAS. By assuming dimensionless gauges implanted on the membrane, the value of the offset voltage was quantified as a function of average thickness of the membrane. In spite of the low values of the parallelism defect (typically about 1% of the membrane thickness), it is shown that there is an offset voltage which is relatively high and perfectly quantified.
Keywords :
elemental semiconductors; membranes; microsensors; piezoresistive devices; pressure sensors; silicon; 30 micron; Si; implanted dimensionless gauges; membrane bottom profile plot; membrane flatness defect; membrane sides parallelism defect; membrane thickness; offset voltage; silicon piezoresistive pressure sensor; Anisotropic magnetoresistance; Biomembranes; Bridge circuits; Chemicals; Etching; Piezoresistance; Piezoresistive devices; Silicon; Temperature sensors; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electronics, Circuits and Systems, 2003. ICECS 2003. Proceedings of the 2003 10th IEEE International Conference on
Print_ISBN :
0-7803-8163-7
Type :
conf
DOI :
10.1109/ICECS.2003.1301933
Filename :
1301933
Link To Document :
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