Property control of textured ETP CVD deposited ZnO(:Al) for application in thin film solar cells

Author

Linden, J.L. ; Groenen, R. ; Loffler, J. ; Rath, J.K. ; Sommeling, P.M. ; Schropp, R.E.I. ; van de Sanden, M.C.M.

Author_Institution

Div. Models & Processes, TNO, Eindhoven, Netherlands

Volume

1

fYear

2003

fDate

18-18 May 2003

Firstpage

42

Abstract

ZnO(:Al) layers are deposited by expanding thermal plasma (ETP) CVD inherently showing the necessary textured surface morphology required for effective light trapping resulting in a high quantum efficiency of thin film solar cells. Surface texture and morphology have been studied by AFM and SEM, optoelectronic properties are derived from spectroscopic ellipsometry combined with reflection and transmission measurements. Amorphous silicon pin solar cells and dye-sensitized cells have been deposited on top of ETP CVD deposited ZnO:Al as a front electrode. The influence of the TCO on the spectral response and the I/V characteristics show promising results.

Keywords

II-VI semiconductors; aluminium; amorphous semiconductors; atomic force microscopy; elemental semiconductors; plasma CVD; scanning electron microscopy; semiconductor thin films; silicon; solar cells; surface morphology; surface texture; zinc compounds; AFM; SEM; Si; ZnO:Al; amorphous silicon pin solar cells; atomic force microscopy; dye-sensitized cells; effective light trapping; expanding thermal plasma; high quantum efficiency; optoelectronic properties; reflection measurement; scanning electron microscopy; spectral response; spectroscopic ellipsometry; surface morphology; surface texture; thin film solar cell; transmission measurement;

fLanguage

English

Publisher

ieee

Conference_Titel

Photovoltaic Energy Conversion, 2003. Proceedings of 3rd World Conference on

Conference_Location

Osaka, Japan

Print_ISBN

4-9901816-0-3

Type

conf

Filename

1305215