• DocumentCode
    413530
  • Title

    Locally contacted thin-film solar cells

  • Author

    Brammer, T. ; Hüpkes, I. ; Krause, M. ; Kluth, O. ; Muller, I. ; Steiberg, H. ; Rech, B.

  • Author_Institution
    Inst. of Photovoltaics, Forschungszentrum Julich GmbH, Germany
  • Volume
    1
  • fYear
    2003
  • fDate
    18-18 May 2003
  • Firstpage
    176
  • Abstract
    Concepts for locally contacted thin-film solar cells are presented. The approach is motivated by device simulations for the case of thin-film silicon solar cells with p-i-n structure. Our devices based on microcrystalline silicon have local contacts on either the p- or n-side made by photolithography, laser techniques or self organised etch masks. So far, no improvement in the open-circuit voltage could be obtained. Possible reasons are discussed.
  • Keywords
    elemental semiconductors; etching; masks; photolithography; self-assembly; semiconductor device models; semiconductor thin films; silicon; solar cells; Si; device simulation; laser technique; locally contacted thin-film solar cell; microcrystalline silicon; open-circuit voltage; p-i-n structure; photolithography; self organised etch mask;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Photovoltaic Energy Conversion, 2003. Proceedings of 3rd World Conference on
  • Conference_Location
    Osaka, Japan
  • Print_ISBN
    4-9901816-0-3
  • Type

    conf

  • Filename
    1305250