Title :
Microstructure and properties of the silicon thin films grown by e-beam evaporation for solar cell application
Author :
Ramanery, F. ; Dias, G.O. ; Guerra, C. ; Vilela, J.M.C. ; Andrade, M.S. ; Branco, J. R T ; Diniz, A.S.A.C.
Author_Institution :
CETEC, Belo Horizonte, Brazil
Abstract :
The effect of plasma assistance during vacuum evaporation was investigated. Silicon films were deposited by e-beam evaporation on Bright Annealed AISI 304 stainless steel and on soda-lime glass substrates at 225/spl deg/C, under 2.28/spl times/10/sup -3/ mbar and e-beam power of 720 W. A low voltage arc was used as a plasma source for ion plating, with argon and argon/hydrogen atmosphere. Structural and mechanical properties of the Si films were evaluated by optical absorption spectroscopy, AFM, FTIR, SEM, XRD, and 3-dimensional profilometry. The results showed that e-beam evaporation under plasma assistance can provide dense Si coatings, with proper optical response; very low roughness and well adhered to glass and stainless steel. Mechanical properties were appraised by ultra-microhardness and scratch testing.
Keywords :
Fourier transform spectra; X-ray diffraction; atomic force microscopy; crystal microstructure; electron beam deposition; elemental semiconductors; infrared spectra; ion plating; microhardness; plasma materials processing; scanning electron microscopy; semiconductor thin films; silicon; solar cells; surface roughness; vacuum deposition; 2.28E-3 mbar; 225 degC; 3-dimensional profilometry; 304 stainless steel; 720 W; AFM; FTIR; Fourier transform infrared spectra; SEM; Si; SiO/sub 2/; X-ray diffraction; XRD; atomic force microscopy; dense Si coating; e-beam evaporation; ion plating; mechanical properties; microstructure; optical absorption spectroscopy; optical response; plasma assistance; plasma source; roughness; scanning electron microscopy; scratch testing; silicon thin film; soda-lime glass substrates; solar cell application; structural properties; ultra-microhardness; vacuum evaporation; voltage arc;
Conference_Titel :
Photovoltaic Energy Conversion, 2003. Proceedings of 3rd World Conference on
Conference_Location :
Osaka, Japan
Print_ISBN :
4-9901816-0-3
