DocumentCode
413703
Title
Large-area deposition for crystalline silicon on glass modules
Author
Basore, Paul A.
Author_Institution
Pacific Solar Pty. Ltd., Sydney, NSW, Australia
Volume
1
fYear
2003
fDate
18-18 May 2003
Firstpage
935
Abstract
This paper presents the current status of the Crystalline Silicon on Glass (CSG) technology for low-cost photovoltaic modules that is being developed at Pacific Solar. This technology combines the low manufacturing cost of large-area monolithic construction with the established durability of crystalline silicon. The heart of the manufacturing sequence for this technology is the PECVD silicon deposition process. Equipment developed for the flat-panel display industry appears to meet the requirements for this process. A single-chamber KAI-800 system from Unaxis has been installed at Pacific Solar that deposits silicon layers onto 0.7-m/sup 2/ sheets of textured glass. Initial results using this equipment are reported, including data for deposition rate, uniformity, manufacturing cost, and the performance of small modules made using material deposited in this system.
Keywords
elemental semiconductors; plasma CVD; semiconductor device manufacture; semiconductor epitaxial layers; semiconductor growth; silicon; solar cells; PECVD; Pacific Solar; Si; SiO/sub 2/; crystalline silicon; deposition rate; flat-panel display industry; glass modules; large-area deposition; large-area monolithic construction; low-cost photovoltaic module; manufacturing cost; manufacturing sequence; single-chamber KAI-800 system;
fLanguage
English
Publisher
ieee
Conference_Titel
Photovoltaic Energy Conversion, 2003. Proceedings of 3rd World Conference on
Conference_Location
Osaka, Japan
Print_ISBN
4-9901816-0-3
Type
conf
Filename
1305436
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