• DocumentCode
    413703
  • Title

    Large-area deposition for crystalline silicon on glass modules

  • Author

    Basore, Paul A.

  • Author_Institution
    Pacific Solar Pty. Ltd., Sydney, NSW, Australia
  • Volume
    1
  • fYear
    2003
  • fDate
    18-18 May 2003
  • Firstpage
    935
  • Abstract
    This paper presents the current status of the Crystalline Silicon on Glass (CSG) technology for low-cost photovoltaic modules that is being developed at Pacific Solar. This technology combines the low manufacturing cost of large-area monolithic construction with the established durability of crystalline silicon. The heart of the manufacturing sequence for this technology is the PECVD silicon deposition process. Equipment developed for the flat-panel display industry appears to meet the requirements for this process. A single-chamber KAI-800 system from Unaxis has been installed at Pacific Solar that deposits silicon layers onto 0.7-m/sup 2/ sheets of textured glass. Initial results using this equipment are reported, including data for deposition rate, uniformity, manufacturing cost, and the performance of small modules made using material deposited in this system.
  • Keywords
    elemental semiconductors; plasma CVD; semiconductor device manufacture; semiconductor epitaxial layers; semiconductor growth; silicon; solar cells; PECVD; Pacific Solar; Si; SiO/sub 2/; crystalline silicon; deposition rate; flat-panel display industry; glass modules; large-area deposition; large-area monolithic construction; low-cost photovoltaic module; manufacturing cost; manufacturing sequence; single-chamber KAI-800 system;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Photovoltaic Energy Conversion, 2003. Proceedings of 3rd World Conference on
  • Conference_Location
    Osaka, Japan
  • Print_ISBN
    4-9901816-0-3
  • Type

    conf

  • Filename
    1305436