DocumentCode
413709
Title
Buried contact solar cells on multicrystalline silicon with optimised bulk and surface passivation
Author
Jooss, W. ; McCann, M. ; Fath, P. ; Roberts, S. ; Bruton, T.M.
Author_Institution
Dept. of Phys., Konstanz Univ., Germany
Volume
1
fYear
2003
fDate
18-18 May 2003
Firstpage
959
Abstract
This paper describes the further development of an industrial processing sequence for large area multicrystalline silicon solar cells applying the buried contact technology for solar cell metallisation. Passivation of crystal defects was investigated by remote plasma hydrogenation at different stages of the processing sequence. The reduction of emitter recombination was examined by the optimisation of the emitter diffusion as well as the growth of a thermal oxide. A record high efficiency for a large area multicrystalline silicon solar cell of 17.6% (V/sub oc/=632.5 mV, J/sub sc/=35.85 mA/cm/sup 2/, FF=77.7%, cell area 144 cm/sup 2/, independently confirmed at FhG-ISE, Germany) was achieved. For this cell, a loss analysis was done to determine the potential for further improvements in solar cell efficiency.
Keywords
crystal defects; elemental semiconductors; hydrogenation; passivation; plasma materials processing; semiconductor device metallisation; short-circuit currents; silicon; solar cells; surface recombination; 17.6 percent; 632.5 mV; Si; bulk passivation; buried contact technology; crystal defect; emitter diffusion; emitter recombination; fill factor; industrial processing; large area multicrystalline silicon solar cell; metallisation; open-circuit voltage; optimised passivation; remote plasma hydrogenation; short-circuit current density; solar cell efficiency; surface passivation;
fLanguage
English
Publisher
ieee
Conference_Titel
Photovoltaic Energy Conversion, 2003. Proceedings of 3rd World Conference on
Conference_Location
Osaka, Japan
Print_ISBN
4-9901816-0-3
Type
conf
Filename
1305442
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