DocumentCode
413720
Title
Optical mismatch in double AR coated c-Si, a simple theoretical and experimental correlation
Author
Aguilar, Jaime ; Matsumoto, Yasuhiro ; Romero, Gabriel ; Reyes, M. Alfredo
Author_Institution
Dept. of Electr. Eng., CINVESTAV-IPN, Mexico City, Mexico
Volume
2
fYear
2003
fDate
18-18 May 2003
Firstpage
1001
Abstract
Theoretical optimization of ARC (antireflecting coating) for both, single and double ARC has been done in the order to obtain minimum reflectance on crystalline silicon surface. Experimental corroboration has been made with the deposition of a simple SiN/sub x/ (silicon nitride) and double SiN/sub x//SiO/sub 2/ (silicon nitride/silicon oxide) ARC on silicon substrates using PECVD (Plasma enhanced chemical vapor deposition) technique. Different refraction indexes were obtained by means of NH/sub 3/ flow adjustment. Reflection measurements as a function of wavelengths revealed some differences with theoretical calculations for both simple- and double-layer ARCs. We demonstrate how important is the ARC thickness for optical matching for single and double ARC. An analysis and discussions are made for a proper interpretation of the observed behavior.
Keywords
antireflection coatings; optical films; plasma CVD coatings; reflectivity; refractive index; silicon compounds; PECVD; Si; SiN/sub x/; SiN/sub x/-SiO/sub 2/; antireflecting coated silicon; crystalline silicon surface; double ARC; optical matching; optical mismatch; plasma enhanced chemical vapor deposition; reflectivity; refraction indexes; silicon nitride layer; silicon nitride-silicon oxide bilayer; silicon substrates; single ARC;
fLanguage
English
Publisher
ieee
Conference_Titel
Photovoltaic Energy Conversion, 2003. Proceedings of 3rd World Conference on
Conference_Location
Osaka, Japan
Print_ISBN
4-9901816-0-3
Type
conf
Filename
1306080
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