• DocumentCode
    413720
  • Title

    Optical mismatch in double AR coated c-Si, a simple theoretical and experimental correlation

  • Author

    Aguilar, Jaime ; Matsumoto, Yasuhiro ; Romero, Gabriel ; Reyes, M. Alfredo

  • Author_Institution
    Dept. of Electr. Eng., CINVESTAV-IPN, Mexico City, Mexico
  • Volume
    2
  • fYear
    2003
  • fDate
    18-18 May 2003
  • Firstpage
    1001
  • Abstract
    Theoretical optimization of ARC (antireflecting coating) for both, single and double ARC has been done in the order to obtain minimum reflectance on crystalline silicon surface. Experimental corroboration has been made with the deposition of a simple SiN/sub x/ (silicon nitride) and double SiN/sub x//SiO/sub 2/ (silicon nitride/silicon oxide) ARC on silicon substrates using PECVD (Plasma enhanced chemical vapor deposition) technique. Different refraction indexes were obtained by means of NH/sub 3/ flow adjustment. Reflection measurements as a function of wavelengths revealed some differences with theoretical calculations for both simple- and double-layer ARCs. We demonstrate how important is the ARC thickness for optical matching for single and double ARC. An analysis and discussions are made for a proper interpretation of the observed behavior.
  • Keywords
    antireflection coatings; optical films; plasma CVD coatings; reflectivity; refractive index; silicon compounds; PECVD; Si; SiN/sub x/; SiN/sub x/-SiO/sub 2/; antireflecting coated silicon; crystalline silicon surface; double ARC; optical matching; optical mismatch; plasma enhanced chemical vapor deposition; reflectivity; refraction indexes; silicon nitride layer; silicon nitride-silicon oxide bilayer; silicon substrates; single ARC;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Photovoltaic Energy Conversion, 2003. Proceedings of 3rd World Conference on
  • Conference_Location
    Osaka, Japan
  • Print_ISBN
    4-9901816-0-3
  • Type

    conf

  • Filename
    1306080