DocumentCode :
413724
Title :
Interfacial structure and current transport properties of sputter-deposited ZnO:Al/c-Si heterojunction solar cells
Author :
Song, Dengyuan ; Neuhaus, Dirk-Holger ; Aberle, Armin G.
Author_Institution :
Centre of Excellence for Adv. Silicon Photovoltaics & Photonics, Univ. of New South Wales, Sydney, NSW, Australia
Volume :
2
fYear :
2003
fDate :
18-18 May 2003
Firstpage :
1017
Abstract :
ZnO:Al/n-Si heterojunction solar cells were made by rf magnetron sputtering. Their interfacial structure was analysed by transmission electron microscopy (TEM). These TEM studies reveal the existence of a non-intentionally grown tunnel oxide layer between the Si wafer and the ZnO:Al film, and thus the devices are actually of the type SIS. The current transport properties of the heterojunction are investigated by means of current-voltage measurements in the temperature range 283 to 363K. Analysis of the experimental results suggests that the dominant current transport mechanism in these devices, at intermediate dark forward bias voltages, is trap-assisted multistep tunneling.
Keywords :
II-VI semiconductors; aluminium; electrical resistivity; elemental semiconductors; interface structure; semiconductor heterojunctions; semiconductor thin films; silicon; solar cells; sputtered coatings; transmission electron microscopy; tunnelling; wide band gap semiconductors; zinc compounds; 283 to 363 K; Si wafer; TEM; ZnO:Al film; ZnO:Al-Si; ZnO:Al/c-Si heterojunction solar cells; current transport properties; current-voltage measurements; interfacial structure; intermediate dark forward bias voltages; resistance; rf magnetron sputtering; sputter deposition; transmission electron microscopy; trap assisted multistep tunneling; tunnel oxide layer;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Photovoltaic Energy Conversion, 2003. Proceedings of 3rd World Conference on
Conference_Location :
Osaka, Japan
Print_ISBN :
4-9901816-0-3
Type :
conf
Filename :
1306084
Link To Document :
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